High-purity gold sputtering target

High-purity gold sputtering target
High-purity gold sputtering target
High-purity gold sputtering target
High-purity gold sputtering target
High-purity gold sputtering target
High-purity gold sputtering target
  •  Product Description

    High-purity gold targets are commonly used as electrodes and metallization materials in physical vapor deposition (PVD) processes,and are applicable in fields such as semiconductor manufacturing,thin-film circuits and precision optical coatings. JFM offers high-quality gold target products. Through strict control of material purity and microstructure,these targets exhibit stable deposition performance during the sputtering process. The products meet customer requirements for film quality,process consistency and electrical connection stability in relevant applications.

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