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Semiconductor

We are an experienced provider of integrated R&D and manufacturing solutions for advanced ceramics in semiconductor applications. Our high-performance materials offer good plasma resistance, thermal stability and electrical insulation for critical processes. Leveraging proven material science expertise, we supply precision ceramic components for wafer processing equipment, including etching, deposition, heat treatment and lithography systems. Our solutions enhance equipment performance and reliability to meet semiconductor manufacturing's rigorous demands. We provide customized material solutions to leading equipment manufacturers.

Related applications

Ceramic Parts for Film Deposition Equipment

We supply precision ceramic components for customized CVD, PVD, ECP, ECD, and ALD processes, as well as durable engineering ceramics for thin-film deposition chambers and wafer processing tools. These include chamber covers, liners, gas mixing manifolds, base heaters, isolators, insulating rings, lifting pads, pins, plasma tubes, and vacuum break filters.

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Ceramic Parts for Film Deposition Equipment

Ceramic Parts for Plasma Etching Equipment

Using high-purity fine ceramic material parts specifically designed by JFM for harsh plasma etching, we maximize the fulfillment of the high purity requirements and extreme environmental demands of plasma etching. This includes the main components made of ceramic materials used in plasma etching equipment, such as window mirrors, focus rings, electrostatic chucks, nozzles, chambers, and gas dispersion discs.

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Ceramic Parts for Plasma Etching Equipment

Ceramic Parts for Ion Implantation Equipment

We supply ceramic spare parts for ion implanters, such as high-purity alumina and silicon nitride, including precision air bearing components, measurement instruments, ultra-flat vacuum chucks, thermally stable pins, screws, frames, insulating rings, interferometer reference mirrors, and scale bases.

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Ceramic Parts for Ion Implantation Equipment

Ceramic Parts for Wafer Inspection Equipment

Used in wafer fixtures, vacuum chucks are widely applied in the semiconductor industry where precise gripping and fixation are required. They serve as fixed fixtures for wafer thinning and cutting processes. JFM offers a variety of precision ceramic vacuum chucks designed to maximize airflow distribution uniformity and suction stability, thereby achieving stable fixation of wafers. Custom non-standard chucks can be designed according to user requirements. The main characteristics of the wafer vacuum chucks include: high flatness and parallelism、dense and uniform structure with high strength、good permeability and uniform adhesion、easy to adjust.

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Ceramic Parts for Wafer Inspection Equipment

Ceramic Parts in Traditional Diffusion and Other Semiconductor Applications

Ceramic components play a vital role in traditional diffusion and other semiconductor applications. They offer customized engineered parts to meet specific needs in these fields.

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Ceramic Parts in Traditional Diffusion And Other Semiconductor Applications

Ceramic Components for Thermal Processing in Semiconductors

We provide high-purity, high-quality ceramic components for lithography and wafer processing needs, including light covers, plasma tubes, light source components, heat sinks, wafer suction devices, step chucks, porous suction devices, electrostatic chucks, photomask substrates, ceramic guide rails, wafer holder components, work tables, and electrical insulators.

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Ceramic Components for Thermal Processing in Semiconductors

Ceramic Components for Wafer Planarization Process (CMP)

We specialize developing ceramic components for CMP applications in semiconductor and FPD production, including polishing platens, grinding discs, chucks, and other critical parts. Utilizing advanced ceramic materials such as alumina, silicon carbide, and zirconia, our precision-engineered CMP polishing components deliver exceptional corrosion resistance, wear resistance, high hardness, and thermal stability - enabling flawless surface planarization and the production of highly competitive, high-performance wafers for state-of-the-art wafer fabrication lines.

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Ceramic Components for Wafer Planarization Process (CMP)

General Semiconductor Applications and Wafer Processing

As a partner in the field of precision ceramic parts technology solutions, JFM is committed to providing comprehensive solutions for semiconductor equipment, including charge dissipation end effectors, heaters, lifting pins, and vacuum break filters, among other high-performance products. Choosing high-purity, high-performance ceramic materials is crucial. Common materials include oxides (Al2O3), silicon nitride (Si3N4), aluminum nitride (AlN), and silicon carbide (SiC), each offering distinct advantages to meet the requirements of semiconductor equipment for high cleanliness, high stability, high precision, high efficiency, and high reliability.

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General Semiconductor Applications and Wafer Processing

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Manufacturing Space: 4,000㎡ (430,556 sq. ft)

In-House Production & Application of Advanced Materials & Key Components

End-to-End Solutions: From Materials to Application

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