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Ceramic Parts for Film Deposition Equipment

Ceramic Parts for Film Deposition Equipment

We supply precision ceramic components for customized CVD, PVD, ECP, ECD, and ALD processes, as well as durable engineering ceramics for thin-film deposition chambers and wafer processing tools. These include chamber covers, liners, gas mixing manifolds, base heaters, isolators, insulating rings, lifting pads, pins, plasma tubes, and vacuum break filters.

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Bell jar

Dome

High-purity ceramic domes are widely used in Novellus Speed equipment to adsorb reaction byproducts, reduce defects, improve yield, and extend PM cycles. They offer high hardness, wear resistance, corrosion resistance, and insulation properties. In electronics, they ensure stable and efficient performance even in high-temperature and corrosive environments, extending equipment lifespan. Custom processing is available based on drawings or samples per customer requirements.
nozzle

Nozzle

In thin film deposition systems, ceramic nozzles are essential for precise control of reaction gas flow and direction. These nozzles feature high-precision dimensions and excellent gas sealing, ensuring accurate transport of reaction gases. Custom machining of materials such as alumina and silicon carbide ceramics includes precision polishing and drilling. Additionally, repeated drilling tests are conducted during the design phase to ensure compliance with target requirements. The precision-engineered ceramic nozzles enable accurate control of gas flow and direction, enhancing the precision and quality of thin film deposition.
ring

Deposition Ring

The deposition serves as a structural support component, stabilizing wafers and substrates to ensure uniformity in thin film deposition. Its design and material selection significantly impact deposition effects and overall equipment performance.
insulator

Ceramic Insulator

Many parts of thin film deposition equipment require insulation, such as electrodes and wires. Ceramic materials, known for their high insulation performance, are ideal for insulating components. Our zirconia and alumina ceramics offer excellent insulation and mechanical strength, maintaining reliable insulation even in harsh conditions like high temperatures and pressures, ensuring safe equipment operation.
pan

Ceramic Disc

To support wafer thin film deposition, ceramic trays require good flatness and surface smoothness, ensuring stability and uniformity during the deposition process. Our silicon carbide ceramic trays feature high hardness, excellent wear resistance, and superior thermal conductivity, allowing them to weight of wafers and friction during deposition while rapidly conducting heat to maintain temperature uniformity.

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