Ceramic Parts for Plasma Etching Equipment

Ceramic Parts for Plasma Etching Equipment

Using high-purity fine ceramic material parts specifically designed by JFM for harsh plasma etching, we maximize the fulfillment of the high purity requirements and extreme environmental demands of plasma etching. This includes the main components made of ceramic materials used in plasma etching equipment, such as window mirrors, focus rings, electrostatic chucks, nozzles, chambers, and gas dispersion discs.

Related materials:

  • ·Oxides: Aluminum oxide ceramics, Zirconium oxide ceramics, Yttrium oxide ceramics
  • ·Nitrides: Aluminum nitride ceramics, Silicon nitride ceramics, Boron nitride ceramics
  • ·Carbides: Silicon carbide ceramics

Chamber Liner

JFM supplies high-purity precision ceramic components specifically designed for demanding plasma etching processes, perfectly suited for the high-purity requirements and extreme conditions of plasma etching. These include windows, focus rings, electrostatic chucks, nozzles, chambers, gas distribution plates, and other key ceramic parts used in plasma etching equipment.
 

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